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Asian Journal of Research in Chemistry
Year : 2018, Volume : 11, Issue : 1
First page : ( 195) Last page : ( 205)
Print ISSN : 0974-4169. Online ISSN : 0974-4150.
Article DOI : 10.5958/0974-4150.2018.00039.1

Comparative Study of Various Chemical Deposition Methods for Synthesis of Thin Films: A Review

Savale P. A.*

Department of Physics, Arts and Science College, Bhalod-425 304, Tal. Yawal Dist. Jalgaon (MS), India

*Corresponding Author E-mail: pa_savale@yahoo.co.in

Online published on 26 March, 2018.

Abstract

In this comparative study, the important chemical deposition methods for synthesis of thin films viz., chemical vapor deposition, solution growth, spray pyrolysis, electrodeposition, anodization and sputtering were studied. In order to optimize the desired film thickness and characteristics, good understanding of the chemical deposition processes is essential. This comparative study discusses about deposition principle, working process of chemical deposition methods, their significance in the whole process of making a substrate deposition, advantages, disadvantages and various possible industrial applications of these methods. These chemical deposition methods can be found in the fabrication and processing technology industries. They have their own unique way of depositing materials on the substrates and hence having their own advantages, disadvantages and limitations in their industrial applications.

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Keywords

Chemical deposition, Methods, Thin films, Advantages, Disadvantages.

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